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Water washing scrubber exhaust gas treatment device
The Scrubber exhaust gas treatment device can treat various types of gases used in etching and chemical vapor deposition processes in industries such
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Scrubber exhaust gas treatment device

The chemical substances and their by-products commonly used in semiconductor processes can generally be divided into:
1. Flammable gases such as SiH4 H2, etc
Toxic gases such as AsH3, PH3, etc
3 Corrosive gases such as HF, HCl, etc
4 greenhouse gases such as CF4, NF3, etc
Due to the harmful effects of the above four gases on the environment or human health, it is necessary to prevent their direct emission into the atmosphere. Therefore, semiconductor factories generally install large central exhaust gas treatment systems But this system only washes the exhaust gas with water Therefore, its application scope is limited to the treatment of water-soluble gases and cannot cope with the rapidly changing and finely divided semiconductor process exhaust gases

Scrubber exhaust gas treatment device semiconductor process exhaust gas treatment method
According to the characteristics of exhaust gas treatment, it can be divided into four treatment methods:
1. Water washing method (for treating corrosive gases)
2 oxidation type (processing combustible and toxic gases)
3 adsorption type (dry) (treating corresponding exhaust gas according to the type of adsorbent material)
4 plasma combustion type (all types of exhaust gases can be treated)
Each type of treatment has its own advantages, disadvantages, and scope of application When washing with water, the equipment is cheap and the treatment method is simple, only capable of treating water-soluble gases; The application range of electric hot water washing is higher than that of water washing, and the operating cost is higher; Dry processing has good efficiency and is not suitable for easy blockage or gas flow.

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